Design Competition

Gen Art invites you to compete in Styles 2008 International Design Competition, a program for emerging fashion designers in the US.

By Kjeld Duits, Wednesday March 19, 2008 - news

Win a chance to present your designs at a high profile New York runway show and compete for one of five $5,000 awards for Design Excellence.

Designers that have debuted at Styles include Rodarte, Peter Som, Jeffrey Chow, Cloak, Duckie Brown, Lulu Frost and Sari Gueron.

For rules and to apply online, please visit GenArt.

Submissions will be accepted until April 5, 2008.

A Selection Committee of influential market editors, stylists, and buyers will review all submissions at a Prescreening Event in Mid April. All finalists will be invited to participate in the Styles 2008 Fashion Show, on May 19th, 2008 in New York City.

 
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